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Tsukuda

Protected Metal Clusters: From Fundamentals to Applications

Medium: Buch
ISBN: 978-0-08-100086-1
Verlag: Elsevier Science & Technology
Erscheinungstermin: 01.09.2015
Lieferfrist: bis zu 10 Tage

Protected Metal Clusters: From Fundamentals to Applications surveys the fundamental concepts and potential applications of atomically precise metal clusters protected by organic ligands.

As this class of materials is now emerging as a result of breakthroughs in synthesis and characterization that have taken place over the last few years, the book provides the first reference with a focus on these exciting novel nanomaterials, explaining their formation, and how, and why, they play an important role in the future of molecular electronics, catalysis, sensing, biological imaging, and medical diagnosis and therapy.


Produkteigenschaften


  • Artikelnummer: 9780081000861
  • Medium: Buch
  • ISBN: 978-0-08-100086-1
  • Verlag: Elsevier Science & Technology
  • Erscheinungstermin: 01.09.2015
  • Sprache(n): Englisch
  • Auflage: Erscheinungsjahr 2015
  • Produktform: Gebunden
  • Gewicht: 697 g
  • Seiten: 372
  • Format (B x H x T): 152 x 229 x 32 mm
  • Ausgabetyp: Kein, Unbekannt
Autoren/Hrsg.

Autoren

Weitere Mitwirkende

1. Introduction, Tatsuya Tsukuda and Hannu Häkkinen 2. Controlled Synthesis: Size Control, Shinjiro Takano and Tatsuya Tsukuda 3. Controlled Synthesis: Composition and Interface Control, Yuichi Negishi 4. Structural Engineering of Heterometallic Nanoclusters, Yu Wang, Huayan Yang and Nanfeng Zheng 5. Structure Determination by Single-Crystal X-Ray Crystallography, Christopher Ackerson 6. Atomic-scale Structure Analysis by Advanced Transmission Electron Microscopy, Richard Palmer and Zhiwei Wang 7. Structure Prediction by Density Functional Theory Calculations, Qing Tang and De-en Jiang 8. Electronic Structure: Development of the Superatom Concept, Hannu Häkkinen 9. Optical Properties and Chirality, Christine Aikens 10. Catalytic Properties, Yuxiang Chen and Rongchao Jin 11. Functionalization and Application, Nirmal Goswami, Jingguo Li and Jianping Xie